Amoled array substrate, method for manufacturing the same and display device

ABSTRACT

The present invention relates to an AMOLED array substrate, a manufacturing method thereof and a display device. The AMOLED array substrate includes at least one first auxiliary line provided in the same layer as but not intersecting with pixel electrodes; and at least one second auxiliary line provided in the same layer as source and drain electrodes but not intersecting with data lines and the source and drain electrodes , wherein: projections of the first and second auxiliary lines on plate electrode are within projection of pixel define layer and at least partially overlap; and the first auxiliary line is electrically connected to the second auxiliary line via a first via hole and to the plate electrode via a second via hole formed in pixel define layer, wherein projection of the first via hole on the plate electrode is within overlapped projection of the first and second auxiliary lines.

TECHNICAL FIELD

Embodiments of the present invention relate to the field of displaytechnology, and particularly relates to an active matrix organic lightemitting diode (AMOLED) array substrate, a method for manufacturing theAMOLED array substrate and a display device including the AMOLED arraysubstrate.

BACKGROUND

In the design of a top-emission AMOLED panel, because a top electrode ofan OLED device needs to be light-transmissive, the top electrode isgenerally made thin. When size of the panel is increased, in-planeresistance of the top electrode is relatively large. Large in-planeresistance of the top electrode will increase IR drop, and excessive IRdrop will lead to nonuniform in-plane brightness, thereby impactinguniformity of a picture. In an AMOLED, the top electrode is generallyformed as an integral planar electrode, which is also referred to asplate electrode, and will be referred to as plate electrode in thepresent invention thereinafter.

SUMMARY

The present invention is provided to improve or increase uniformity ofin-plane resistance of a plate electrode of a top-emission AMOLED anddecrease the in-plane resistance of the plate electrode.

According to one aspect of embodiments of the present invention, thereis provided an AMOLED array substrate, comprising: a plate electrodeelectrically connected to an electrode lead provided on the periphery ofthe plate electrode; a plurality of pixel electrodes arranged in anarray; an organic light emitting body provided between the plurality ofpixel electrodes and the plate electrode; at least one first auxiliaryline that is provided in the same layer as the pixel electrodes but doesnot intersect with the pixel electrodes; and at least one secondauxiliary line that is provided in the same layer as source and drainelectrodes of the AMOLED array substrate but does not intersect withdata lines, the source and drain electrodes of the AMOLED arraysubstrate, wherein: projections of the first auxiliary line and thesecond auxiliary line on the plate electrode are within projection of apixel define layer of the AMOLED array substrate on the plate electrodeand at least partially overlap with each other; and the first auxiliaryline is electrically connected to the second auxiliary line via a firstvia hole and is electrically connected to the plate electrode via asecond via hole formed in the pixel define layer of the AMOLED arraysubstrate, wherein projection of the first via hole on the plateelectrode is within overlapped projection of the first auxiliary lineand the second auxiliary line.

Optionally, the at least one first auxiliary line includes a pluralityof first auxiliary lines, and the plurality of first auxiliary lines areparallel to gate lines of the AMOLED array substrate; the at least onesecond auxiliary line includes a plurality of second auxiliary lines,and the plurality of second auxiliary lines are parallel to the datalines of the AMOLED array substrate; and projections of the plurality offirst auxiliary lines and the plurality of second auxiliary lines on theplate electrode form a mesh pattern including a plurality of meshes.

Further optionally, the pixel electrodes and the meshes of the meshpattern are in one-to-one correspondence, and projection of each pixelelectrode on the plate electrode is within the corresponding mesh of themesh pattern.

Optionally, projection of the second via hole on the plate electrode iswithin the overlapped projection of the first auxiliary line and thesecond auxiliary line, and the projections of the first via hole and thesecond via hole on the plate electrode overlap.

In the above array substrate, optionally, each first auxiliary line isprovided correspondingly to one gate line, and projections of the firstauxiliary line and the corresponding gate line on the plate electrode atleast partially overlap.

In the above array substrate, optionally, the AMOLED array substratefurther includes a passivation layer provided between a layer where thesource and drain electrodes are provided and the pixel electrodes, andthe first via hole passes through the passivation layer to electricallyconnect the first auxiliary line to the second auxiliary line.

Further optionally, the AMOLED array substrate further includes aplanarization layer provided between the passivation layer and the pixelelectrodes, and the first via hole passes through the passivation layerand the planarization layer to electrically connect the first auxiliaryline to the second auxiliary line.

In the above array substrate, optionally, the electrode lead is providedaround the entire periphery of the plate electrode; and at least one endof each auxiliary line is electrically connected to the electrode lead.

In the above array substrate, optionally, the overlapped projection ofthe at least one first auxiliary line and the at least one secondauxiliary line is at least positioned at a center area of the plateelectrode.

According to another aspect of the embodiments of the present invention,there is provided a display device, comprising any one of the aboveAMOLED array substrates.

According to still another aspect of the embodiments of the presentinvention, there is provided a method for manufacturing an AMOLED arraysubstrate, wherein the AMOLED array substrate comprises: a plurality ofpixel electrodes arranged in an array; a plate electrode electricallyconnected to an electrode lead provided on the periphery of the plateelectrode; and an organic light emitting body provided between theplurality of pixel electrodes and the plate electrode, and the methodcomprises steps of: forming, in the same layer as the pixel electrodes,at least one first auxiliary line that does not intersect with the pixelelectrodes; forming, in the same layer as source and drain electrodes ofthe AMOLED array substrate, at least one second auxiliary line that doesnot intersect with date lines, the source and drain electrodes of theAMOLED array substrate, wherein projections of the first auxiliary lineand the second auxiliary line on the plate electrode are withinprojection of a pixel define layer of the AMOLED array substrate on theplate electrode and at least partially overlap with each other; forminga first via hole for electrically connecting the first auxiliary line tothe second auxiliary line at a position corresponding to overlappedprojection of the first auxiliary line and the second auxiliary line;and forming a second via hole for electrically connecting the secondauxiliary line to the plate electrode in the pixel define layer of theAMOLED array substrate.

In the above method, optionally, the step of forming at least one firstauxiliary line comprises forming a plurality of first auxiliary lines,such that the plurality of first auxiliary lines are parallel to gatelines of the AMOLED array substrate; and the step of forming at leastone second auxiliary line comprises forming a plurality of secondauxiliary lines, such that the plurality of second auxiliary lines areparallel to the data lines of the AMOLED array substrate; andprojections of the plurality of first auxiliary lines and the pluralityof second auxiliary lines on the plate electrode form a mesh patternincluding a plurality of meshes.

Further optionally, the pixel electrodes are formed to be in one-to-onecorrespondence with the meshes of the mesh pattern, and projection ofeach pixel electrode on the plate electrode is within the correspondingmesh of the mesh pattern formed by the first auxiliary lines and thesecond auxiliary lines.

In the above method, optionally, the second via hole is formed at aposition corresponding to the overlapped projection of the firstauxiliary line and the second auxiliary line, and the projections of thefirst via hole and the second via hole on the plate electrode overlap.

In the above method, optionally, each first auxiliary line is formedcorrespondingly to a gate line, and projections of the first auxiliaryline and the corresponding gate line on the plate electrode at leastpartially overlap.

In the above method, optionally, a passivation layer is formed between alayer where the source and drain electrodes are provided and the pixelelectrodes, and the first via hole passes through the passivation layerto electrically connect the first auxiliary line to the second auxiliaryline.

In the above method, optionally, a planarization layer is formed betweenthe passivation layer and the pixel electrodes, and the first via holepasses through the passivation layer and the planarization layer toelectrically connect the first auxiliary line to the second auxiliaryline.

In the above method, optionally, the first auxiliary line and the pixelelectrodes are made of a same material and are simultaneously formed byone patterning process; and the second auxiliary line and the source anddrain electrodes are made of a same material and are simultaneouslyformed by one patterning process.

In the above method, optionally, the method further comprises a step ofshielding the second via hole to avoid the organic light emitting bodyfrom entering the second via hole, while applying the organic lightemitting body.

In the above method, optionally, the electrode lead is provided aroundthe entire periphery of the plate electrode; and the method furthercomprises a step of electrically connecting at least one end of eachauxiliary line to the electrode lead.

In the above method, optionally, the formed at least one first auxiliaryline includes the first auxiliary line whose projection on the plateelectrode passes a center area of the plate electrode, and the formed atleast one second auxiliary line includes the second auxiliary line whoseprojection on the plate electrode passes the center area of the plateelectrode.

The above technical solutions of the present invention achieve thebeneficial effects as follows.

In the above technical solutions, the first auxiliary line iselectrically connected to the second auxiliary line via the first viahole, and is electrically connected to the plate electrode via thesecond via hole formed in the pixel define layer of the AMOLED arraysubstrate, so that the resistor network formed by the first and secondauxiliary lines is connected in parallel with the plate electrodedirectly, which can decrease the in-plane resistance of the plateelectrode and improve the uniformity of the in-plane resistance of theplate electrode.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic top view of an AMOLED array substrate provided byan exemplary embodiment of the present invention.

FIG. 2 is a schematic cross-sectional view of the AMOLED array substratetaken along line L in FIG. 1.

DETAILED DESCRIPTION

An AMOLED array substrate, a method for manufacturing the same and adisplay device provided by embodiments of the present invention will bedescribed in detail below in conjunction with the accompanying drawings.

Sizes and shapes of individual components in the accompanying drawingsdo not reflect actual scale of the AMOLED array substrate, and is onlyfor the purpose of schematically illustrating contents of the presentinvention.

As shown in FIGS. 1 and 2, the embodiments of the present inventionprovide an AMOLED array substrate, including:

a plate electrode 10, which is electrically connected to an electrodelead 20 provided on the periphery of the plate electrode 10;

a plurality of pixel electrodes 30 arranged in an array;

an organic light emitting body 40 provided between the plurality ofpixel electrodes 30 and the plate electrode 10;

at least one first auxiliary line 50, which is provided in the samelayer as the pixel electrodes 30 but does not intersect with the pixelelectrodes; and

at least one second auxiliary line 60, which is provided in the samelayer as source and drain electrodes of the AMOLED array substrate butdoes not intersect with data lines DL and the source and drainelectrodes of the AMOLED array substrate,

wherein:

projections of the first auxiliary line 50 and the second auxiliary line60 on the plate electrode 10 are within projection of a pixel definelayer 80 of the AMOLED array substrate on the plate electrode 10 and atleast partially overlap with each other; and

the first auxiliary line 50 is electrically connected to the secondauxiliary line 60 via a first via hole 92, wherein projection of thefirst via hole 92 on the plate electrode 10 is within the overlappedprojection of the first auxiliary line 50 and the second auxiliary line60 on the plate electrode 10, and the first auxiliary line 50 iselectrically connected to the plate electrode 10 via a second via hole94 formed in the pixel define layer 80 of the AMOLED array substrate.

As shown in FIG. 2, the AMOLED array substrate further includes a basesubstrate 120, and all of the above structures are provided on the basesubstrate 120. The base substrate 120 may be made of glass, transparentresin, quartz, sapphire, or the like, which is not limited in thepresent invention.

An OLED (organic light emitting diode) in the AMOLED array substrateprovided by the embodiments of the present invention may be a commonOLED, or a white OLED (WOLED), which is not limited in the presentinvention.

Further, the plate electrode 10 may serve as the cathode of an OLED, andin this case, the pixel electrode 30 serves as the anode of the OLED;alternatively, the plate electrode 10 may serve as the anode of an OLED,and in this case, the pixel electrode 30 serves as the cathode of theOLED, thereby forming an inverted OLED structure, which is not limitedin the present invention and may be chosen according to designrequirement of the device.

In the technical solution of the present invention, the first auxiliaryline 50 is electrically connected to the second auxiliary line 60 viathe first via hole 92, and is electrically connected to the plateelectrode 10 via the second via hole 94 formed in the pixel define layer80 of the AMOLED array substrate, so that the resistor network formed bythe first auxiliary line(s) 50 and second auxiliary line(s) 60 isconnected in parallel with the plate electrode 10 directly. In this way,the in-plane resistance of the plate electrode 10 can be reduced, andthe uniformity of the in-plane resistance of the plate electrode 10 canbe improved.

In one example, the at least one first auxiliary line includes aplurality of first auxiliary lines 50, and the first auxiliary lines 50are parallel to gate lines GL of the AMOLED array substrate; the atleast one second auxiliary line includes a plurality of second auxiliarylines 60, and the second auxiliary lines are parallel to the data linesDL of the AMOLED array substrate; and projections of the plurality offirst auxiliary lines 50 and the plurality of second auxiliary lines 60on the plate electrode 10 form a mesh pattern including a plurality ofmeshes, as shown in FIG. 1. In this case, projections of the firstauxiliary lines 50 and the second auxiliary lines 60 on the plateelectrode 10 have overlapped portions (intersection points), i.e., theparts indicated by symbol A in FIG. 1, and thereinafter, theseintersection points are referred to as projection intersection points.

In this case, both the first auxiliary lines 50 and the second auxiliarylines 60 are substantially evenly distributed, so that electricalconnection points between the first auxiliary lines 50 and the plateelectrode 10 are substantially evenly distributed, thereby furtherimproving uniformity of the in-plane resistance and uniformity of thein-plane brightness of the entire plate electrode 10.

Needless to say, the first auxiliary lines 50 and the second auxiliarylines 60 may be arranged parallel to each other, which is not limited inthe present invention, as long as the projections of the first auxiliarylines 50 on the plate electrode 10 and the projections of the secondauxiliary lines 60 on the plate electrode 10 are both within theprojection of the pixel define layer 80 on the plate electrode 10 and atleast partially overlap, the first auxiliary lines 50 do not intersectwith the pixel electrodes 30 provided in the same layer as the firstauxiliary lines 50, and the second auxiliary lines 60 do not intersectwith the source and drain electrodes provided in the same layer as thesecond auxiliary lines 60.

Further, in the example shown in FIG. 1, one first auxiliary line 50 isprovided correspondingly to each gate line GL, and one second auxiliaryline 60 is provided correspondingly to each data line DL. In this case,the pixel electrodes 30 and the meshes of the mesh pattern are inone-to-one correspondence, and projection of each pixel electrode 30 onthe plate electrode 10 is within the corresponding mesh of the meshpattern. In this way, for each pixel structure, the resistor networkformed by the plurality of first auxiliary lines 50 and the plurality ofsecond auxiliary lines 60 can electrically contact the plate electrode10 at four points, so as to ensure uniformity of in-plane resistance ofa part of the plate electrode corresponding to each pixel structure.

In an optional embodiment, the second via hole 94 may be provided suchthat its projection on the plate electrode 10 is within the overlappedprojection of the first auxiliary line 50 and the second auxiliary line60 on the plate electrode 10. In this case, positions where the firstvia holes 92 and the second via holes 94 are provided correspond to therespective projection intersection points. Further, as shown in FIG. 2,the projections of the first via hole 92 and the second via hole 94 onthe plate electrode 10 may overlap. In this way, space ofnon-light-emitting area of the array substrate can be effectivelyutilized.

Further preferably, projection intersection points of the firstauxiliary lines 50 and the second auxiliary lines 60 include theprojection intersection point which is substantially located in a centerarea of the plate electrode 10 (i.e., the projection intersection pointsof the first auxiliary lines 50 and the second auxiliary lines 60 are atleast substantially located at the center area of the plate electrode10). In a case that the electrode lead 20 is provided around the entireperiphery of the plate electrode 10, the center of the plate electrode10 is generally the farthest from the electrode lead 20. In this way,the center of the plate electrode 10 is electrically connected with theresistor network formed by the auxiliary lines, which facilitatesimproving uniformity of the in-plane resistance of the entire plateelectrode 10.

It should be noted that, in order to save costs, it is possible to useonly one first auxiliary line 50 and only one second auxiliary line 60,and the projection intersection point of the two auxiliary lines issubstantially positioned at the center of the plate electrode 10.

It should be noted that, in order to save costs, it may be unnecessaryto provide one first auxiliary line 50 correspondingly to each gate lineGL, or, the number of the second auxiliary lines 60 in FIG. 2 may bereduced, furthermore, the number of the first auxiliary lines 50 is notnecessarily equal to the number of the second auxiliary lines 60.However, to ensure the uniformity of the in-plane resistance of theentire plate electrode 10, both the first auxiliary lines 50 and thesecond auxiliary lines 60 should be substantially evenly distributed. Inthis case, projections, on the plate electrode 10, of a plurality ofpixel electrodes 30 are within a same mesh of the mesh pattern, that is,the plurality of pixel electrodes 30 correspond to one mesh.

In one example, each first auxiliary line 50 is provided correspondinglyto a gate line GL, and projection of the first auxiliary line 50 on theplate electrode 10 and the projection of the corresponding gate line GLon the plate electrode 10 at least partially overlap. In the AMOLEDarray substrate, gate lines and data lines define pixel structures,thus, by setting the first auxiliary lines 50 and the gate lines GL inan overlapping manner, space occupied by the first auxiliary lines 50can be reduced as much as possible, i.e., the space of the pixelelectrodes 30 is increased, while avoiding electric contact between thefirst auxiliary lines 50 and the pixel electrodes 30.

As shown in FIG. 2, the AMOLED array substrate may further include apassivation layer 110 provided between a layer 70 where the source anddrain electrodes are provided (thereinafter referred to as source anddrain electrodes layer 70) and the pixel electrodes 30, and in thiscase, the first via hole 92 passes through the passivation layer 110 ofthe AMOLED array substrate to electrically connect the first auxiliaryline 50 to the corresponding second auxiliary line 60. Optionally, theAMOLED array substrate may further include a planarization layer 100provided between the passivation layer 110 and the pixel electrodes 30,and in this case, the first via hole 92 passes through the passivationlayer 110 and the planarization layer 100 of the AMOLED array substrateto electrically connect the first auxiliary line 50 to the correspondingsecond auxiliary line 60.

As shown in FIG. 1, the electrode lead 20 is provided around the entireperiphery of the plate electrode 10; and at least one end of eachauxiliary line 50/60 is electrically connected to the electrode lead 20.Thus, the resistor network formed by the auxiliary lines 50 and 60 isdirectly connected with the plate electrode 10 in parallel, which cansignificantly improve the uniformity of the in-plane resistance of theentire plate electrode 10.

It should be noted that, in the present invention, it is unnecessary toform the via holes 92 and 94 at all positons corresponding to theoverlapped projections of the first auxiliary lines 50 and the secondauxiliary lines 60 to electrically connect the first auxiliary lines 50to the second auxiliary lines 60 and connect the first auxiliary lines50 to the plate electrode 10. The via holes 92 and/or 94 may be formedat a part of positions corresponding to the overlapped projections.

The embodiments of the present invention further provide a displaydevice, which includes the above AMOLED array substrate. The displaydevice may be any product or component having a display function, suchas an OLED panel, a mobile phone, a tablet computer, a television, adisplay, a notebook computer, a digital frame, a navigator, or the like.Based on the above AMOLED array substrate, in-plane resistance of theplate electrode 10 can be reduced, uniformity of the in-plane resistanceof the entire plate electrode 10 can be improved, and thus displayperformance of the display panel can be improved.

In the technical solution of the present invention, the first auxiliaryline 50 is electrically connected to the second auxiliary line 60 viathe first via hole 92, and is electrically connected to the plateelectrode 10 via the second via hole 94 formed in the pixel define layer80 of the AMOLED array substrate, so that the resistor network formed bythe first auxiliary lines 50 and the second auxiliary lines 60 isdirectly connected with the plate electrode 10 in parallel.

The embodiments of the present invention further provide a method formanufacturing an AMOLED array substrate having the abovecharacteristics. The AMOLED array substrate comprises: a plurality ofpixel electrodes arranged in an array; a plate electrode connected to anelectrode lead provided on the periphery of the plate electrode; and anorganic light emitting body provided between the plurality of pixelelectrodes and the plate electrode.

The method for manufacturing the AMOLED array substrate according to thepresent invention may include the following steps:

forming, in the same layer as the pixel electrodes 30 at least one firstauxiliary line 50 that does not intersect with the pixel electrodes 30;

forming, in the same layer as source and drain electrodes of the AMOLEDarray substrate, at least one second auxiliary line 60 that does notintersect with date lines DL and the source and drain electrodes of theAMOLED array substrate, wherein projections of the first auxiliary line50 and the second auxiliary line 60 on the plate electrode 10 are withinprojection of a pixel define layer 80 of the AMOLED array substrate onthe plate electrode 10 and at least partially overlap with each other;

forming a first via hole 92 for electrically connecting the firstauxiliary line 50 to the second auxiliary line 60 at a positioncorresponding to the overlapped projection of the first auxiliary line50 and the second auxiliary line 60; and

forming, in the pixel define layer of the AMOLED array substrate, asecond via hole 94 for electrically connecting the first auxiliary line50 to the plate electrode 10.

In the above method, a plurality of first auxiliary lines 50 and aplurality of second auxiliary lines 60 may be formed, such that thefirst auxiliary lines 50 are parallel to gate lines GL of the AMOLEDarray substrate, the second auxiliary lines 60 are parallel to the datalines DL of the AMOLED array substrate, and projections of the pluralityof first auxiliary lines 50 and the plurality of second auxiliary lines60 on the plate electrode 10 form a mesh pattern including a pluralityof meshes. In this case, both the first auxiliary lines 50 and thesecond auxiliary lines 60 are substantially evenly distributed, so thatelectrical connection points between the first auxiliary lines 50 andthe plate electrode 10 are substantially evenly distributed, therebyfurther improving uniformity of the in-plane resistance of the entireplate electrode 10.

Further, the pixel electrodes 30 are formed to be in one-to-onecorrespondence with the meshes of the mesh pattern, and projection ofeach pixel electrode on the plate electrode 10 is within thecorresponding mesh of the mesh pattern formed by the first auxiliarylines 50 and the second auxiliary lines 60. In this way, for each pixelstructure, the resistor network formed by the plurality of firstauxiliary lines 50 and the plurality of second auxiliary lines 60 canelectrically contact the plate electrode 10 at four points, so as toensure uniformity of in-plane resistance of the plate electrodecorresponding to each pixel structure.

In the above method, in an optional embodiment, the second via hole 94may also be formed at a position corresponding to the overlappedprojection of the first auxiliary line 50 and the second auxiliary line60. In this case, the positions where the first via holes 92 and thesecond via holes 94 are provided correspond to the projectionintersection points. Further, as shown in FIG. 2, the projections of thefirst via hole 92 and the second via hole 94 on the plate electrode 10may overlap. Thus, space of non-light-emitting area of the AMOLED arraysubstrate can be effectively utilized.

Further optionally, the formed at least one first auxiliary lineincludes a first auxiliary line whose projection on the plate electrodepasses through a center area of the plate electrode, and the formed atleast one second auxiliary line includes a second auxiliary line whoseprojection on the plate electrode passes through the center area of theplate electrode. In this way, projection intersection points of thefirst auxiliary lines 50 and the second auxiliary lines 60 include aprojection intersection point which is substantially located in thecenter area of the plate electrode 10. In a case that the electrode lead20 is provided around the entire periphery of the plate electrode 10,the center of the plate electrode 10 is generally the farthest from theelectrode lead 20. The center of the plate electrode 10 is electricallyconnected with the resistor network formed by the auxiliary lines 50 and60, which facilitates improving uniformity of the in-plane resistance ofthe entire plate electrode 10.

In the above method, in an optional embodiment, each first auxiliaryline 50 is formed correspondingly to a gate line GL, and projections ofthe first auxiliary line 50 and the corresponding gate line GL on theplate electrode 10 at least partially overlap. In the AMOLED arraysubstrate, gate lines GL and data lines DL define pixel structures,thus, by setting the first auxiliary lines 50 and the gate lines GL inan overlapping manner, the space in the non-display area occupied by thefirst auxiliary lines 50 can be reduced as much as possible, i.e., thespace of the pixel electrodes 30 is increased, while avoiding electriccontact between the first auxiliary lines 50 and the pixel electrodes30.

In the above method, as shown in FIG. 2, a passivation layer 110 may beformed between the source and drain electrodes layer 70 and the pixelelectrodes 30, and in this case, the first via hole 92 passes throughthe passivation layer 110 of the AMOLED array substrate to electricallyconnect the first auxiliary line 50 to the second auxiliary line 60. Inan optional embodiment, a planarization layer 100 may be further formedbetween the passivation layer 110 and the pixel electrodes 30, and inthis case, the first via hole 92 passes through the passivation layer110 and the planarization layer 100 of the AMOLED array substrate toelectrically connect the first auxiliary line 50 to the second auxiliaryline 60.

In the above method, in order to save costs, the first auxiliary line(s)50 and the pixel electrodes 30 are made of a same material and aresimultaneously formed by one patterning process; and the secondauxiliary line(s) 60 and the source and drain electrodes layer 70 aremade of a same material, and the second auxiliary line(s) 60 and thesource and drain electrodes are simultaneously formed by one patterningprocess. The patterning process may generally include photoresistapplication, exposure, development, etching, photoresist stripping, andthe like; needless to say, in practice, there are cases that patterningis performed without using a mask, for example, there may be otherpatterning method in which there is no need to adopt a mask, such asprinting or the like, and any process that can form the required patterncan be referred to as the patterning process, which is not limited inthe present invention.

As is known by those skilled in the art, when forming the firstauxiliary line 50, the material for forming the first auxiliary line 50may enter into the first via hole 92, resulting in that the firstauxiliary line 50 is electrically connected to the second auxiliary line60 under the first via hole 92. When forming the plate electrode 10, thematerial for forming the plate electrode 10 may enter into the secondvia hole 94, resulting in that the plate electrode 10 is electricallyconnected to the first auxiliary line 50 under the second via hole 94and thus also electrically connected to the second auxiliary line 60.

The above method may further include a step of shielding, while applyingthe organic light emitting body 40, the second via hole 94 to avoid theorganic light emitting body 40 from entering into the second via hole94,.

In the above method, in the case that the electrode lead 20 is providedaround the entire periphery of the plate electrode 10, the methodfurther comprises a step of electrically connecting at least one end ofeach auxiliary line to the electrode lead 20. In this way, the resistornetwork formed by the auxiliary lines is directly connected with theplate electrode 10 in parallel, thereby significantly improving theuniformity of the in-plane resistance of the entire plate electrode 10.

Obviously, those of ordinary skill in the art can make variousmodifications and variations to the present invention without departingfrom the spirit and scope of the present invention. If thesemodifications and variations made to the present invention fall into thescope defined by the appended claims of the present invention andequivalents thereof, the present invention is intended to encompassthese modifications and variations.

1. An AMOLED array substrate, comprising: a plate electrode, which iselectrically connected to an electrode lead provided on the periphery ofthe plate electrode; a plurality of pixel electrodes arranged in anarray; an organic light emitting body, which is provided between theplurality of pixel electrodes and the plate electrode; at least onefirst auxiliary line, which is provided in the same layer as the pixelelectrodes but does not intersect with the pixel electrodes; and atleast one second auxiliary line, which is provided in the same layer assource and drain electrodes of the AMOLED array substrate but does notintersect with data lines and the source and drain electrodes of theAMOLED array substrate, wherein: projections of the first auxiliary lineand the second auxiliary line on the plate electrode are withinprojection of a pixel define layer of the AMOLED array substrate on theplate electrode and at least partially overlap with each other; and thefirst auxiliary line is electrically connected to the second auxiliaryline via a first via hole and is electrically connected to the plateelectrode via a second via hole formed in the pixel define layer of theAMOLED array substrate, wherein projection of the first via hole on theplate electrode is within overlapped projection of the first auxiliaryline and the second auxiliary line.
 2. The AMOLED array substrateaccording to claim 1, wherein, the at least one first auxiliary lineincludes a plurality of first auxiliary lines, and the first auxiliarylines are parallel to gate lines of the AMOLED array substrate; the atleast one second auxiliary line includes a plurality of second auxiliarylines, and the second auxiliary lines are parallel to the data lines ofthe AMOLED array substrate; and projections of the plurality of firstauxiliary lines and the plurality of second auxiliary lines on the plateelectrode form a mesh pattern including a plurality of meshes.
 3. TheAMOLED array substrate according to claim 2, wherein, the pixelelectrodes and the meshes of the mesh pattern are in one-to-onecorrespondence, and projection of each pixel electrode on the plateelectrode is within the corresponding mesh of the mesh pattern.
 4. TheAMOLED array substrate according to claim 1, wherein, each firstauxiliary line is provided correspondingly to one gate line, andprojections of the first auxiliary line and the corresponding gate lineon the plate electrode at least partially overlap.
 5. The AMOLED arraysubstrate according to claim 1, wherein, projection of the second viahole on the plate electrode is within the overlapped projection of thefirst auxiliary line and the second auxiliary line, and the projectionsof the first via hole and the second via hole on the plate electrodeoverlap.
 6. The AMOLED array substrate according to claim 1, wherein,the AMOLED array substrate further includes a passivation layer providedbetween a layer where the source and drain electrodes are provided andthe pixel electrodes, and the first via hole passes through thepassivation layer to electrically connect the first auxiliary line tothe second auxiliary line.
 7. The AMOLED array substrate according toclaim 6, wherein, the AMOLED array substrate further includes aplanarization layer provided between the passivation layer and the pixelelectrodes, and the first via hole passes through the passivation layerand the planarization layer to electrically connect the first auxiliaryline to the second auxiliary line.
 8. The AMOLED array substrateaccording to claim 1, wherein, the electrode lead is provided around theentire periphery of the plate electrode; and at least one end of eachauxiliary line is electrically connected to the electrode lead.
 9. TheAMOLED array substrate according to claim 1, wherein, the overlappedprojection of the at least one first auxiliary line and the at least onesecond auxiliary line is at least positioned at a center area of theplate electrode.
 10. A display device, comprising the AMOLED arraysubstrate according to claim
 1. 11. A method for manufacturing an AMOLEDarray substrate, wherein: the AMOLED array substrate comprises: aplurality of pixel electrodes arranged in an array; a plate electrodeelectrically connected to an electrode lead provided on the periphery ofthe plate electrode; and an organic light emitting body provided betweenthe plurality of pixel electrodes and the plate electrode, and themethod comprises steps of: forming, in the same layer as the pixelelectrodes, at least one first auxiliary line that does not intersectwith the pixel electrodes; forming, in the same layer as source anddrain electrodes of the AMOLED array substrate, at least one secondauxiliary line that does not intersect with date lines and the sourceand drain electrodes of the AMOLED array substrate, wherein projectionsof the first auxiliary line and the second auxiliary line on the plateelectrode are within projection of a pixel define layer of the AMOLEDarray substrate on the plate electrode and at least partially overlapwith each other; forming a first via hole for electrically connectingthe first auxiliary line to the second auxiliary line at a positioncorresponding to overlapped projection of the first auxiliary line andthe second auxiliary line; and forming, in the pixel define layer of theAMOLED array substrate, a second via hole for electrically connectingthe second auxiliary line to the plate electrode.
 12. The methodaccording to claim 11, wherein, the step of forming at least one firstauxiliary line comprises forming a plurality of first auxiliary lines,such that the first auxiliary lines are parallel to gate lines of theAMOLED array substrate; and the step of forming at least one secondauxiliary line comprises forming a plurality of second auxiliary lines,such that the second auxiliary lines are parallel to the data lines ofthe AMOLED array substrate, and projections of the plurality of firstauxiliary lines and the plurality of second auxiliary lines on the plateelectrode form a mesh pattern including a plurality of meshes.
 13. Themethod according to claim 12, wherein, the pixel electrodes are formedto be in one-to-one correspondence with the meshes of the mesh pattern,and projection of each pixel electrode on the plate electrode is withinthe corresponding mesh of the mesh pattern formed by the first auxiliarylines and the second auxiliary lines.
 14. The method according to claim11, wherein, each first auxiliary line is formed correspondingly to onegate line, and projections of the first auxiliary line and thecorresponding gate line on the plate electrode at least partiallyoverlap.
 15. The method according to claim 11, wherein, the second viahole is formed at a position corresponding to the overlapped projectionof the first auxiliary line and the second auxiliary line, and theprojections of the first via hole and the second via hole on the plateelectrode overlap.
 16. The method according to claim 11, furthercomprising a step of: forming a passivation layer between a layer wherethe source and drain electrodes are provided and the pixel electrodes,wherein the first via hole passes through the passivation layer toelectrically connect the first auxiliary line to the second auxiliaryline.
 17. The method according to claim 16, further comprising a stepof: forming a planarization layer between the passivation layer and thepixel electrodes, wherein the first via hole passes through thepassivation layer and the planarization layer to electrically connectthe first auxiliary line to the second auxiliary line.
 18. The methodaccording to claim 11, wherein, the first auxiliary line and the pixelelectrodes are made of a same material and are simultaneously formed byone patterning process; and the second auxiliary line and the source anddrain electrodes are made of a same material and are simultaneouslyformed by one patterning process; and optionally, the method furthercomprises a step of: shielding the second via hole to avoid the organiclight emitting body from entering the second via hole, while applyingthe organic light emitting body.
 19. (canceled)
 20. The method accordingclaim 11, wherein, the electrode lead is provided around the entireperiphery of the plate electrode; and the method further comprises astep of electrically connecting at least one end of each auxiliary lineto the electrode lead.
 21. The method according to claim 11, wherein,the formed at least one first auxiliary line includes the firstauxiliary line whose projection on the plate electrode passes a centerarea of the plate electrode, and the formed at least one secondauxiliary line includes the second auxiliary line whose projection onthe plate electrode passes the center area of the plate electrode.